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https://designers-guide.org/forum/YaBB.pl Design >> Analog Design >> leakage in 0.13u process https://designers-guide.org/forum/YaBB.pl?num=1225422431 Message started by hugh on Oct 30th, 2008, 8:07pm |
Title: leakage in 0.13u process Post by hugh on Oct 30th, 2008, 8:07pm Hi all, I'm designing a PLL and using the tsmc 0.13G process. But the gate leakage current is about 1nA/um^2 for NMOS. So when using nmos as capacitors what should I do? Another question is the Ioff is also high, 500pA for NMOS of 10/0.13. So the power down current for a large scale digital circuit is also very high, I guess about 100uA for about 200K gates. How to solve this? Some suggest to use the 0.13 LP process. However I heard the leakage current is more severe in 90nm, and since we will migrate to 90nm later, I think we'd better solve it now. Thanks for any suggestions, Hugh |
Title: Re: leakage in 0.13u process Post by Monkeybad on Nov 3rd, 2008, 12:45am Hi! hugh You can use the 3.3V NMOS rather than the 1.2V for the low pass filter capacitances. The leakage current of 3.3V NMOS is much smaller than the 1.2V. |
Title: Re: leakage in 0.13u process Post by hugh on Nov 3rd, 2008, 2:30am Thanks, Monkeybad. But the cap density of 3.3V device is about 3 times lower, the area cost will be high. Is there any circuit techniques possible? B.R., Hugh |
Title: Re: leakage in 0.13u process Post by Monkeybad on Nov 3rd, 2008, 7:14pm Some papers discuss using another charge pump to compensate the leakage current. Here is one of these papers I've found before. But it uses 90nm process. "A 1-4 Gbps quad transceiver cell using PLL with gate-current leakage compensator in 90nm CMOS" In my design I use the 3.3V device to solve this problem. The area cost is acceptable for my application now. |
Title: Re: leakage in 0.13u process Post by Berti on Nov 4th, 2008, 3:49am Hi, I think that the gate leakage of 1nA/um2 is for vgs=1.2V. If your voltage at the gate is lower leakage will reduce, too. Maybe then it is ok for you design. Otherwise you could also think about MIM/metal caps... Regards |
Title: Re: leakage in 0.13u process Post by hugh on Nov 5th, 2008, 3:56am Thanks, Monkeybad & Berti. Now I think the gate leakage can be handled by careful design. What about the off state current? Our SoC has about 2M gates. And the power down current is now about 500uA, unacceptable. I think the only way is to power down the LDO for digital circuits also. But this need the support of system vendor. :( Any suggestions? B.R. Hugh |
Title: Re: leakage in 0.13u process Post by Berti on Nov 5th, 2008, 10:15pm If no high-Vt devices are available you could power the digital core at a lower supply voltage....if you timing constraints allow for that. You will need level-shifter for the outputs, but the leakage will reduced a lot. Cheers |
Title: Re: leakage in 0.13u process Post by hugh on Nov 6th, 2008, 3:20am Berti wrote on Nov 5th, 2008, 10:15pm:
Really good idea. Also some paper point to this way. Many thanks. |
Title: Re: leakage in 0.13u process Post by Tlaloc on Nov 6th, 2008, 8:14am I have also heard of a very large switch being put in series with the supply to power down portions of logic that are not being used. Of course, it would still leak if you are using the same type of device, but since it would be a PMOS, you should come out ahead. Using a higher Vt device--with the larger area--would also reduce the leakage. |
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