rfmems wrote on Oct 30th, 2006, 6:52am:Thank you, ACWong!
The same question for cmos capacitors, how to get a optimized w/l ratio? certainly a square helps matching and reduce parasitics, but what else? Q factor? I simulated with mimcap and vppcap, it seems both have the best Q when they are squares
and what if it is a "NFET in NWELL" cap? then I really have no clue, channel resistance? maybe, but what is the optimum?
square is best for MIM
NFET in nwell... for RF the Q is usually pretty crummy, but yes you need to optimise channel resistance and poly resistance, so it comes down to the sheet resistance of your poly and nwell... probably you'll make it a bit wider as nwell is probably more resistive (although some of these structures use N+ especially in BiCMOS where the N+ is a BJT collector.)
Anyway for both MIM and poly-insulator-semiconductor (i like to call them PIS) caps you should concern your self with which plate has the parasitic and connect your caps with this in mind.
In the case of MIM, its easy to ensure your top plate is at most RF sensitive node.
In the case of PIS, its also easy to see the parastic nwell to psub diode is on the Nwell plate... but also remember the higher the voltage on the Nwell plate, the more reverse biased the parasitic diode is, so the better for higher frequencies... of course you will be need to make sure the voltage charactersitics of the main cap is ok!