Geoffrey_Coram
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I would think that the effect of the (smaller number of) traps would be larger in a smaller-geometry process. Also, 1/f noise can average out for large devices: one trap is occupied, but another isn't, and the effects cancel.
Probably also the trap density is a function of the maturity of the process. In fact, the developers of the HiSIM mosfet model claim that 1/f noise needs no fitting parameters for a mature process!
S. Matsumoto et al, "1/f noise characteristics in 100nm-MOSFETs and its modeling for circuit simulation," IEICE Trans. Electron., vol. E88-C, pp. 247 254, 2005.
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