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isolation (Read 878 times)
aaron_do
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isolation
Aug 13th, 2007, 11:29pm
 
Hi all,

just wondering, I'm using a n-well process, so does that mean my pmos will have better immunity to substrate noise than nmos? Basically, there's a diode between the nwell and the psubstrate and so the psubstrate would have to be above VDD to leak...

thanks,
Aaron
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vivkr
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Re: isolation
Reply #1 - Aug 13th, 2007, 11:51pm
 
Hi Aaron,

Normally, the additional diode will help you in getting better immunity, provided your VDD (tied to the well) does not get contaminated by noise.
This seems like the standard CMOS process though. Or am I missing something?

Regards
Vivek
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aaron_do
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Re: isolation
Reply #2 - Aug 14th, 2007, 2:00am
 
Hi Vivek,

thanks for the reply. In the process i'm using, the nmos have no wells. They are directly in the p-substrate. So i was thinking that they would suffer more substrate noise than the pmos in the nwells.

cheers,
Aaron
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vivarf
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Re: isolation
Reply #3 - Sep 3rd, 2007, 7:13pm
 
I think it is trivial that nmos will suffer more substrate noise since its channel is inside the whole substrate instead of seperated well as p-well process.
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