Hi All,

From which PROCESS NODE one starts to face issues due to STI (Sub Trench Isolation) and WPE (Well Proximatry Effect)?

Although these are LDE (Layout Dependend Effect) but Analog Designers need to consider these effects in design phase with right model parameter values.

I know there are no effect on most 180nm Foundry. What about 130nm....90nm...65nm...so one...

BR

AM